Learning Unit Four
Quiz 4
Test what you have learned by answering the following questions:

 

1. For growth of an oxide of thickness 0.5 microns, what thickness of silicon is consumed:

0.25 microns
0.3 microns
0.22 microns
0.30 microns
2. When diffusivity is very small, the oxidation rate depends on the supply of oxidant to the interface and the process is called:

Reaction-controlled case
Diffusion-controlled case
3. Which of the following has a higher breakdown voltage:

Dry oxidation
Wet oxidation
4. Wet oxidation has a significantly higher oxidation rate than dry oxidation.

True
False
5. Which of the following is used for masking oxide, blanket field oxide and the LOCOS oxide:

Dry oxidation
Wet oxidation
6. Oxide growth rate depends on (please choose the most accurate answer):



Temperature
Oxygen source
Crystal orientation
Dopant concentration
All of the above
7. Heavily doped silicon is oxidized faster than lightly doped silicon:

True
False
8. Low-pressure increases oxidation rate:

True
False
9. Which of the following affect thin oxide growth:

Cleaning techniques
Purity of gases used
Time
Temperature
All of the above