More Accurate Treatment of Two-Dimensional Ion Profiles

 

 

The following three factors must be taken into account to give more accurate two-dimensional ion profiles [2]:

 

 

 

          

 

Fig. 4 Modified masked ion profiles for 50keV arsenic. Contours show concentration of arsenic after implanting a dose of 1015 cm-2. (a) Ions penetrate through the thinner regions of a sloping mask edge, increasing the doping near the corner. (b) a thick mask casts a shadow at the base which is 12% of the mask height for a 7o beam tilt. Note also the variation in lateral standard deviation with depth.[2]