·
Diffusion
coefficient tells us how effectively does an impurity atom diffuse through the
silicon wafer.
·
Diffusion
coefficient depends exponentially on temperature
D = D0 exp(-EA / kT)
Where D0 is the
frequency factor (in cm2/sec)
EA
is the activation energy in eV
T is temperature (in K)
K is
Boltzmann constant in eV/K
Example: Calculate
the diffusion coefficient for boron at 1100°C.
We know that D = D0
exp(-EA / kT)
D0=10.5 cm2/s
T =1100°C=1100 + 273 = 1373 K
EA = 3.69 eV / K
K=8.62X10-5 eV/K
D=2.96X10-13 cm2/sec